Control of the Redox Potential by Microcontroller Technology: Researching the Leaching of Chalcopyrite

The leaching of chalcopyrite under different redox potentials was studied with a potential controlling device based on microcontroller technology. test carried out in 500 mL flask 4 g pure and 200 sulfuric acid. additional total Fe concentration 0.1 mol/kg, the initial pH 0.7. Chalcopyrite tests 400 mV 600 (vs. Ag/AgCl, same below) controlled 350 mV, 450 were at temperature 60 °C stirring speed 300 rpm. results showed that dissolution could not be hindered until granular intermediates (S0 Sn2?) accumulated to certain amount surface. main passivating species may iron-deficient polysulfides. At passivation by polysulfides overcome galvanic effect between pyrite chalcopyrite, rapidly oxidized Cu rate reaching up 32% 7 h, while it only 15% other experimental groups. However, 450–500 destroyed, leading significant decrease rate. When metal-deficient promoted; thus, weakened.